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dc.contributor.authorLin, WJen_US
dc.contributor.authorTseng, TYen_US
dc.contributor.authorWu, YZen_US
dc.contributor.authorLin, SPen_US
dc.contributor.authorTu, SLen_US
dc.contributor.authorChang, Hen_US
dc.contributor.authorYang, SJen_US
dc.contributor.authorLin, INen_US
dc.date.accessioned2014-12-08T15:02:11Z-
dc.date.available2014-12-08T15:02:11Z-
dc.date.issued1996-12-01en_US
dc.identifier.issn0957-4522en_US
dc.identifier.urihttp://hdl.handle.net/11536/878-
dc.description.abstractGrowth of [00/] preferentially oriented Pb1-xLax(ZryTiz) O-3 (PLZT) thin films was carried out by using targets of either tetragonal or rhombohedral structure. The tetragonal films grew in a similar manner to the rhombohedral films. Both the substrate temperature (500 or 550 degrees C) and oxygen pressure (0.1 mbar, 10 Pa) required stringent control in order to deposit [00/]-textured PLZT thin films. The ferroelectric and fatigue properties were examined. The films deposited on YBa2Cu3O7-x and CeO2 coated silicon (YBCO/CeO2/Si) substrates possessed substantially lower remanent polarization than those grown on YBCO coated SrTiO3 (YBCO/STO) substrates; this is ascribed to inferior crystallinity of the PLZT/BCO/CeO2/Si films. The remanent polarization of tetragonal PLZT films was degraded insignificantly up to 10(8) polarization switching cycles, whereas that of rhombohedral PLZT films was already reduced to 80% of the initial value after 10(8) cycles. Low endurance of rhombohedral films was ascribed to the periodic stress induced when the inclined spontaneous polarization vector (P=[111]) switched. On the other hand, high endurance of tetragonal films was explained by the fact that the spontaneous polarization vector (P=[001]) lies along the film's normal such that switch cycles cause no lateral stress.en_US
dc.language.isoen_USen_US
dc.titleGrowth and fatigue properties of pulsed laser deposited Pb1-xLax(ZryTiz)O-3 thin films with [001] preferred orientationen_US
dc.typeArticleen_US
dc.identifier.journalJOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICSen_US
dc.citation.volume7en_US
dc.citation.issue6en_US
dc.citation.spage409en_US
dc.citation.epage417en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:A1996VX92200008-
dc.citation.woscount2-
Appears in Collections:Articles