完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Shieh, Jiann | en_US |
dc.contributor.author | Ravipati, Srikanth | en_US |
dc.contributor.author | Ko, Fu-Hsiang | en_US |
dc.contributor.author | Ostrikov, Kostya (Ken) | en_US |
dc.date.accessioned | 2014-12-08T15:11:34Z | - |
dc.date.available | 2014-12-08T15:11:34Z | - |
dc.date.issued | 2011-05-04 | en_US |
dc.identifier.issn | 0022-3727 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1088/0022-3727/44/17/174010 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/8882 | - |
dc.description.abstract | Plasma-made nanostructures show outstanding potential for applications in nanotechnology. This paper provides a concise overview on the progress of plasma-based synthesis and applications of silicon nanograss and related nanostructures. The materials described here include black silicon, Si nanotips produced using a self-masking technique as well as self-organized silicon nanocones and nanograss. The distinctive features of the Si nanograss, two-tier hierarchical and tilted nanograss structures are discussed. Specific applications based on the unique features of the silicon nanograss are also presented. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Plasma-made silicon nanograss and related nanostructures | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1088/0022-3727/44/17/174010 | en_US |
dc.identifier.journal | JOURNAL OF PHYSICS D-APPLIED PHYSICS | en_US |
dc.citation.volume | 44 | en_US |
dc.citation.issue | 17 | en_US |
dc.citation.epage | en_US | |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | 材料科學與工程學系奈米科技碩博班 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.contributor.department | Graduate Program of Nanotechnology , Department of Materials Science and Engineering | en_US |
dc.identifier.wosnumber | WOS:000289512700010 | - |
dc.citation.woscount | 14 | - |
顯示於類別: | 期刊論文 |