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dc.contributor.author曾俊元en_US
dc.contributor.authorTSENG TSEUNG-YUENen_US
dc.date.accessioned2014-12-13T10:29:20Z-
dc.date.available2014-12-13T10:29:20Z-
dc.date.issued2006en_US
dc.identifier.govdocNSC95-2221-E009-278zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/89149-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=1309524&docId=241992en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.language.isozh_TWen_US
dc.title高介電常數鈦酸鍶基閘極氧化物及元件的製作、結構與特性研究(III)zh_TW
dc.titleInvestigations of High-K SrTiO/sub 3/-Base Gate Dielectrics and Devices Fabrication and Their Structures and Properties(III)en_US
dc.typePlanen_US
dc.contributor.department交通大學電子工程系zh_TW
顯示於類別:研究計畫