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dc.contributor.authorChung, Wan-Fangen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorLi, Hung-Weien_US
dc.contributor.authorChen, Shih-Chingen_US
dc.contributor.authorChen, Yu-Chunen_US
dc.contributor.authorTseng, Tseung-Yuenen_US
dc.contributor.authorTai, Ya-Hsiangen_US
dc.date.accessioned2014-12-08T15:11:44Z-
dc.date.available2014-12-08T15:11:44Z-
dc.date.issued2011-04-11en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3580614en_US
dc.identifier.urihttp://hdl.handle.net/11536/9003-
dc.description.abstractThe environment-dependent electrical performances as a function of temperature for sol-gel derived amorphous indium-gallium-zinc-oxide (a-IGZO) thin film transistors are investigated in this letter. In the ambients without oxygen, thermal activation dominates and enhances device performance. In oxygen-containing environments, mobility and drain current degrades and the threshold slightly increase as temperature increases. We develop a porous model for a-IGZO film relating to the drain current and mobility lowering due to film porosity and oxygen adsorption/penetration. It also relates to the threshold voltage recovery at high temperature owing to the varying form of adsorbed oxygen and the combination of oxygen and vacancies. (C) 2011 American Institute of Physics. [doi:10.1063/1.3580614]en_US
dc.language.isoen_USen_US
dc.titleEnvironment-dependent thermal instability of sol-gel derived amorphous indium-gallium-zinc-oxide thin film transistorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.3580614en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume98en_US
dc.citation.issue15en_US
dc.citation.epageen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000289580800035-
dc.citation.woscount42-
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