| 標題: | 高科技製程排氣在真空情況下的細微粒控制技術(III) Fine Particle Control Technology in the Vacuum Exhaust Conditions of Semiconductor Manufacturing Processes(III) |
| 作者: | 蔡春進 Chuen-Jinn Tsai 交通大學環境工程研究所 |
| 公開日期: | 2005 |
| 官方說明文件#: | NSC94-2211-E009-001 |
| URI: | http://hdl.handle.net/11536/90405 https://www.grb.gov.tw/search/planDetail?id=1094595&docId=206255 |
| Appears in Collections: | Research Plans |
- 高科技製程排氣在真空情況下的細微粒控制技術(I) / 蔡春進;Chuen-Jinn Tsai
- 高科技製程排氣在真空情況下的細微粒控制技術(II) / 蔡春進;Chuen-Jinn Tsai
- White smoke emission from a semiconductor manufacturing plant / Tsai, CJ;Miao, CC;Lu, HC
- An efficient venturi scrubber system to remove submicron particles in exhaust gas / Tsai, CJ;Lin, CH;Wang, YM;Hunag, CH;Li, SN
- An efficient wet electrostatic precipitator for removing nanoparticles, submicron and micron-sized particles / Chen, Tzu-Ming;Tsai, Chuen-Jinn;Yan, Shaw-Yi;Li, Shou-Nan
- Removal of air pollutants in the make-up air of a semiconductor plant by fine water spray / Tsai, CJ;Huang, CH;Lu, HH
Loading...