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dc.contributor.authorYang, Po-Yuen_US
dc.contributor.authorWang, Jyh-Liangen_US
dc.contributor.authorTsai, Wei-Chihen_US
dc.contributor.authorWang, Shui-Jinnen_US
dc.contributor.authorLin, Jia-Chuanen_US
dc.contributor.authorLee, I-Cheen_US
dc.contributor.authorChang, Chia-Tsungen_US
dc.contributor.authorCheng, Huang-Chungen_US
dc.date.accessioned2014-12-08T15:11:48Z-
dc.date.available2014-12-08T15:11:48Z-
dc.date.issued2011-04-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.50.04DN07en_US
dc.identifier.urihttp://hdl.handle.net/11536/9047-
dc.description.abstractAluminum-doped zinc oxide (AZO) nanowire (NW) arrays incorporating an offset thin-film transistor (offset-TFT) have been proposed to achieve high field-emission (FE) stability. The AZO NW field emission arrays (FEAs) were hydrothermally grown at a low temperature of 85 degrees C. The uncontrolled AZO NW FEAs demonstrated superior FE characteristics (i.e., turn-on field of similar to 2.17 V/mu m and threshold field of similar to 3.43 V/mu m) compared with those of the conventional CNT FEAs grown at a temperature below 600 degrees C. However, uncontrolled AZO NW FEAs show a larger current fluctuation of 15.6%. Therefore, the offset-TFTs were used to control the AZO NW FEAs. Consequently, the fluctuation of AZO NW FEAs could be significantly reduced to less than 2%. This novel field emission device exhibits good emission stability, low-voltage controllability, low-temperature processing, and structural simplicity, making it promising for applications in flat panel displays. (C) 2011 The Japan Society of Applied Physicsen_US
dc.language.isoen_USen_US
dc.titleHigh Field-Emission Stability of Offset-Thin-Film Transistor-Controlled Al-Doped Zinc Oxide Nanowiresen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.50.04DN07en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume50en_US
dc.citation.issue4en_US
dc.citation.epageen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000289722400172-
dc.citation.woscount2-
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