直流磁控電漿濺鍍腔體中多重尺度及物理現象之模擬及實驗研究(II)

Full metadata record

DC Field	Value	Language
dc.contributor.author	吳宗信	en_US
dc.contributor.author	WU JONG-SHINN	en_US
dc.date.accessioned	2014-12-13T10:30:51Z	-
dc.date.available	2014-12-13T10:30:51Z	-
dc.date.issued	2005	en_US
dc.identifier.govdoc	NSC94-2212-E009-012	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/90490	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=1129110&docId=215076	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.title	直流磁控電漿濺鍍腔體中多重尺度及物理現象之模擬及實驗研究(II)	zh_TW
dc.title	Multiscale and Multiphysics Modeling and Experiment of a DC-Magnetron Sputtering Chamber(II)	en_US
dc.type	Plan	en_US
dc.contributor.department	交通大學機械工程系	zh_TW
Appears in Collections:	Research Plans