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dc.contributor.authorChou, Y. L.en_US
dc.contributor.authorChung, Y. T.en_US
dc.contributor.authorWang, Tahuien_US
dc.contributor.authorKu, S. H.en_US
dc.contributor.authorZou, N. K.en_US
dc.contributor.authorChen, Vincenten_US
dc.contributor.authorLu, W. P.en_US
dc.contributor.authorChen, K. C.en_US
dc.contributor.authorLu, Chih-Yuanen_US
dc.date.accessioned2014-12-08T15:11:50Z-
dc.date.available2014-12-08T15:11:50Z-
dc.date.issued2011-04-01en_US
dc.identifier.issn0741-3106en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2011.2109031en_US
dc.identifier.urihttp://hdl.handle.net/11536/9073-
dc.description.abstractDiscrete nitride program charge loss in a small-area SONOS Flash memory cell during retention is observed. Our measurement shows that a retention V(t) of a programmed SONOS cell exhibits a stepwise evolution with retention time. Individual single-program charge-loss-induced threshold voltage shifts (Delta V(t)) are characterized. We find the following: 1) The magnitude of Delta V(t) exhibits an exponential distribution, which is believed due to a current-path percolation effect caused by random program charges and substrate dopants, and 2) program-state V(t) retention loss has large variations in different cells and P/E cycles due to the percolation effect. We develop a Monte Carlo analysis to take into account the distribution of Delta V(t) and a tunneling front model to study the spread of a retention V(t) distribution in a SONOS Flash memory.en_US
dc.language.isoen_USen_US
dc.titleVariations of V(t) Retention Loss in a SONOS Flash Memory Due to a Current-Path Percolation Effecten_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LED.2011.2109031en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.citation.volume32en_US
dc.citation.issue4en_US
dc.citation.spage458en_US
dc.citation.epage460en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
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