| 標題: | 193奈米微影用嵌附式減光型相移圖罩之研製與模擬 Fabrication and Simulation of an Embedded Attenuated Phase-Shift Mask in 193 nm |
| 作者: | 龍文安 Loong Wen-an 交通大學應用化學系 |
| 公開日期: | 2000 |
| 官方說明文件#: | NSC89-2215-E009-026 |
| URI: | http://hdl.handle.net/11536/91607 https://www.grb.gov.tw/search/planDetail?id=720330&docId=135305 |
| Appears in Collections: | Research Plans |
- 193奈米微影用嵌附式減光型相移圖罩之研製與模擬 / 龍文安;Loong Wen-an
- 鉻矽氮類嵌附式減光型相移圖罩之研製與模擬 / 呂奎亮;Leu Kwei-liang;龍文安;Loong Wen-an
- 193奈米微影用正規與高透射率嵌附層材料之探討及減光型相移圖罩應用之模擬 / 林政旻;Cheng-ming Lin;龍文安;Dr. Loong Wen-an
- 鉬矽氧嵌附式減光型相移圖罩之研製與模擬 / 陳玉蓉;Chen Yu-rung;龍文安;Loong Wen-an
- Chemical stability of embedded material for attenuated phase-shifting mask and application of high-transmittance attenuated phase-shifting mask for 0.1 mu m contact pattern in 193 nm lithography / Lin, CM;Loong, WA
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