高科技製程排氣在真空情況下的細微粒控制技術(I)

Full metadata record

DC Field	Value	Language
dc.contributor.author	蔡春進	en_US
dc.contributor.author	Chuen-Jinn Tsai	en_US
dc.date.accessioned	2014-12-13T10:32:58Z	-
dc.date.available	2014-12-13T10:32:58Z	-
dc.date.issued	2003	en_US
dc.identifier.govdoc	NSC92-2211-E009-016	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/91810	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=819576&docId=155122	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.title	高科技製程排氣在真空情況下的細微粒控制技術(I)	zh_TW
dc.title	Fine Particle Control Technology in the Vacuum Exhaust Conditions of Semiconductor Manufacturing Processes(I)	en_US
dc.type	Plan	en_US
dc.contributor.department	國立交通大學環境工程研究所	zh_TW
Appears in Collections:	Research Plans