低溫電漿蝕刻製程與電漿診斷技術之開發研究---子計畫三：蝕刻製程橢圓儀線上即時量測系統之研製(I)

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DC Field	Value	Language
dc.contributor.author	趙于飛	en_US
dc.date.accessioned	2014-12-13T10:33:23Z	-
dc.date.available	2014-12-13T10:33:23Z	-
dc.date.issued	2003	en_US
dc.identifier.govdoc	NSC92-2623-7009-001-NU	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/92038	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=801133&docId=153297	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.title	低溫電漿蝕刻製程與電漿診斷技術之開發研究---子計畫三：蝕刻製程橢圓儀線上即時量測系統之研製(I)	zh_TW
dc.title	Ellipsometry and Its in Situ/Real Time Monitoring on Plasma Etching Process(I)	en_US
dc.type	Plan	en_US
dc.contributor.department	國立交通大學光電工程研究所	zh_TW
Appears in Collections:	Research Plans

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