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dc.contributor.authorZan, Hsiao-Wenen_US
dc.contributor.authorKao, Shih-Chinen_US
dc.contributor.authorPan, Huang-Weien_US
dc.contributor.authorLin, Kun Chihen_US
dc.contributor.authorHsu, Chen Chouen_US
dc.contributor.authorGan, F. Y.en_US
dc.date.accessioned2014-12-08T15:12:04Z-
dc.date.available2014-12-08T15:12:04Z-
dc.date.issued2007en_US
dc.identifier.isbn978-957-28522-4-8en_US
dc.identifier.urihttp://hdl.handle.net/11536/9246-
dc.description.abstractIn this paper, the influence of drain bias on the bias stress effect in pentacene-based organic thin-film transistors was studied. It was found that, under gate bias stress measurement, the threshold voltage shift was strongly affected by the drain bias due to the varied channel charge amount. As a result, conventional stretched-exponential function was modified with a channel charge normalization factor to describe the dependence of threshold voltage shift on the stressing time. The result is important for the design of organic electronic or OTFT active-matrix display, in which the influence of both the gate and the drain biases has to be considered.en_US
dc.language.isoen_USen_US
dc.titleThe modified bias-stress effect in organic TFTsen_US
dc.typeProceedings Paperen_US
dc.identifier.journalIDMC'07: PROCEEDINGS OF THE INTERNATIONAL DISPLAY MANUFACTURING CONFERENCE 2007en_US
dc.citation.spage515en_US
dc.citation.epage518en_US
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentInstitute of Displayen_US
dc.identifier.wosnumberWOS:000258177700133-
Appears in Collections:Conferences Paper