標題: The modified bias-stress effect in organic TFTs
作者: Zan, Hsiao-Wen
Kao, Shih-Chin
Pan, Huang-Wei
Lin, Kun Chih
Hsu, Chen Chou
Gan, F. Y.
顯示科技研究所
Institute of Display
公開日期: 2007
摘要: In this paper, the influence of drain bias on the bias stress effect in pentacene-based organic thin-film transistors was studied. It was found that, under gate bias stress measurement, the threshold voltage shift was strongly affected by the drain bias due to the varied channel charge amount. As a result, conventional stretched-exponential function was modified with a channel charge normalization factor to describe the dependence of threshold voltage shift on the stressing time. The result is important for the design of organic electronic or OTFT active-matrix display, in which the influence of both the gate and the drain biases has to be considered.
URI: http://hdl.handle.net/11536/9246
ISBN: 978-957-28522-4-8
期刊: IDMC'07: PROCEEDINGS OF THE INTERNATIONAL DISPLAY MANUFACTURING CONFERENCE 2007
起始頁: 515
結束頁: 518
Appears in Collections:Conferences Paper