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dc.contributor.authorKuo, Yan-Fuen_US
dc.contributor.authorHuang, Shih-Cheen_US
dc.contributor.authorChao, Yu-Teen_US
dc.contributor.authorTai, Ya-Hsiangen_US
dc.date.accessioned2014-12-08T15:12:05Z-
dc.date.available2014-12-08T15:12:05Z-
dc.date.issued2007en_US
dc.identifier.isbn978-957-28522-4-8en_US
dc.identifier.urihttp://hdl.handle.net/11536/9268-
dc.description.abstractThe proposed analytical circuit based on the slicing model further explains the behavior of the gate-to-source capacitance CGS and gate-to-drain capacitance CGD curves of the LTPS TFT at different measuring frequencies. The degradation mechanisms and damaged locations can be identified according to the frequency responses of the CGS and CGD curves.en_US
dc.language.isoen_USen_US
dc.subjectpoly-Si TFTsen_US
dc.subjectcapacitance-voltageen_US
dc.subjectslicing modelen_US
dc.subjectDC stress degradationen_US
dc.titleCapacitance-voltage behaviors of the LTPS TFTs before and after DC stress explained by the slicing modelen_US
dc.typeProceedings Paperen_US
dc.identifier.journalIDMC'07: PROCEEDINGS OF THE INTERNATIONAL DISPLAY MANUFACTURING CONFERENCE 2007en_US
dc.citation.spage523en_US
dc.citation.epage525en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000258177700135-
Appears in Collections:Conferences Paper