完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Kuo, Yan-Fu | en_US |
dc.contributor.author | Huang, Shih-Che | en_US |
dc.contributor.author | Chao, Yu-Te | en_US |
dc.contributor.author | Tai, Ya-Hsiang | en_US |
dc.date.accessioned | 2014-12-08T15:12:05Z | - |
dc.date.available | 2014-12-08T15:12:05Z | - |
dc.date.issued | 2007 | en_US |
dc.identifier.isbn | 978-957-28522-4-8 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/9268 | - |
dc.description.abstract | The proposed analytical circuit based on the slicing model further explains the behavior of the gate-to-source capacitance CGS and gate-to-drain capacitance CGD curves of the LTPS TFT at different measuring frequencies. The degradation mechanisms and damaged locations can be identified according to the frequency responses of the CGS and CGD curves. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | poly-Si TFTs | en_US |
dc.subject | capacitance-voltage | en_US |
dc.subject | slicing model | en_US |
dc.subject | DC stress degradation | en_US |
dc.title | Capacitance-voltage behaviors of the LTPS TFTs before and after DC stress explained by the slicing model | en_US |
dc.type | Proceedings Paper | en_US |
dc.identifier.journal | IDMC'07: PROCEEDINGS OF THE INTERNATIONAL DISPLAY MANUFACTURING CONFERENCE 2007 | en_US |
dc.citation.spage | 523 | en_US |
dc.citation.epage | 525 | en_US |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | Department of Photonics | en_US |
dc.identifier.wosnumber | WOS:000258177700135 | - |
顯示於類別: | 會議論文 |