完整后设资料纪录
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dc.contributor.author汪大晖en_US
dc.contributor.authorWANG TAHUIen_US
dc.date.accessioned2014-12-13T10:35:26Z-
dc.date.available2014-12-13T10:35:26Z-
dc.date.issued2001en_US
dc.identifier.govdocNSC90-2215-E009-066zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/93431-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=665696&docId=126372en_US
dc.description.sponsorship行政院国家科学委员会zh_TW
dc.language.isozh_TWen_US
dc.subject氮化矽zh_TW
dc.subject快闪记忆体zh_TW
dc.subject物理特性zh_TW
dc.subject电子可抹拭唯读记忆体zh_TW
dc.subjectSilicon nitrideen_US
dc.subjectFlash memoryen_US
dc.subjectPhysical characterizationen_US
dc.subjectEEPROMen_US
dc.title一种新式氮化矽快闪式记忆元件研究(I)zh_TW
dc.titlePhysics, Characterization and Design of Oxide-Nitride-Oxide Flash EEPROM Devices (I)en_US
dc.typePlanen_US
dc.contributor.department国立交通大学电子工程学系zh_TW
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