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dc.contributor.authorAl Akhrass, S.en_US
dc.contributor.authorReiter, G.en_US
dc.contributor.authorHou, S. Y.en_US
dc.contributor.authorYang, M. H.en_US
dc.contributor.authorChang, Y. L.en_US
dc.contributor.authorChang, F. C.en_US
dc.contributor.authorWang, C. F.en_US
dc.contributor.authorYang, A. C. -M.en_US
dc.date.accessioned2019-04-03T06:40:22Z-
dc.date.available2019-04-03T06:40:22Z-
dc.date.issued2008-05-02en_US
dc.identifier.issn0031-9007en_US
dc.identifier.urihttp://dx.doi.org/10.1103/PhysRevLett.100.178301en_US
dc.identifier.urihttp://hdl.handle.net/11536/9353-
dc.description.abstractA nonmonotonic, two-stage dewetting behavior was observed for spin coated thin viscoelastic polymer films on soft elastic substrates. At times shorter than the relaxation time of the polymer (t <tau(rep)), dewetting generated deep trenches in the soft rubbery substrate which, in turn, almost stopped dewetting. At later stages (t >tau(rep)), dewetting accelerated, accompanied by an unstable rim. However, holes nucleated at t <tau(rep) showed only this second-stage behavior. Our observations are attributed to large elastic deformations in the substrate caused by transient residual stresses within the film.en_US
dc.language.isoen_USen_US
dc.titleViscoelastic thin polymer films under transient residual stresses: Two-stage dewetting on soft substratesen_US
dc.typeArticleen_US
dc.identifier.doi10.1103/PhysRevLett.100.178301en_US
dc.identifier.journalPHYSICAL REVIEW LETTERSen_US
dc.citation.volume100en_US
dc.citation.issue17en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000255524300087en_US
dc.citation.woscount24en_US
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