| 標題: | 超高真空化學氣相沉積低溫新穎複晶矽薄膜電晶體之製作與可靠度分析---子計畫二：退火製程對超高真空化學氣相沈積法成長之複晶矽薄膜結構的影響與退火複晶矽薄膜電晶體的製作(III) Annealing Effects on UHVCVD Polysilicon Thin-Film Structure and Fabrication of Annealed Polysilicon TFT(III) |
| 作者: | 馮明憲 國立交通大學材料科學工程研究所 |
| 公開日期: | 2000 |
| 官方說明文件#: | NSC89-2218-E009-082 |
| URI: | http://hdl.handle.net/11536/93739 https://www.grb.gov.tw/search/planDetail?id=597398&docId=112577 |
| Appears in Collections: | Research Plans |
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