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dc.contributor.authorLee, Ya-Juen_US
dc.contributor.authorKuo, Hao-Chungen_US
dc.contributor.authorLu, Tien-Changen_US
dc.contributor.authorWang, Shing-Chungen_US
dc.contributor.authorNg, Kar Waien_US
dc.contributor.authorLau, Kei Mayen_US
dc.contributor.authorYang, Zu-Poen_US
dc.contributor.authorChang, Allan Shih-Pingen_US
dc.contributor.authorLin, Shawn-Yuen_US
dc.date.accessioned2014-12-08T15:12:14Z-
dc.date.available2014-12-08T15:12:14Z-
dc.date.issued2008-05-01en_US
dc.identifier.issn0733-8724en_US
dc.identifier.urihttp://dx.doi.org/10.1109/JLT.2008.922151en_US
dc.identifier.urihttp://hdl.handle.net/11536/9398-
dc.description.abstractWe investigate the mechanism responding for performance enhancement of gallium nitride (GaN)-based light-emitting diode (LED) grown on chemical wet-etching-patterned sapphire substrate (CWE-PSS) with V-Shaped pit features on the top surface. According to temperature-dependent photoluminescence (PL) measurement and the measured external quantum efficiency, the structure can simultaneously enhance both internal quantum efficiency and light extraction efficiency. Comparing to devices grown on planar sapphire substrate, the threading dislocation defects of LED grown on CWE-PSS are reduced from 1.28 x10(9)/cm(2) to 3.62 x10(8)/cm(2), leading to a 12.5% enhancement in internal quantum efficiency. In terms of the theoretical computing of radiation patterns, the V-Shaped pits roughening surface can be thought of as a strong diffuser with paraboloidal autocorrelation function, increasing the escape probability of trapped photons and achieving a 20% enhancement in light extraction efficiency. Moreover, according to the measurement of optical diffraction power, CWE-PSS demonstrated superior guided light extraction efficiency than that of planar sapphire substrate, thus an extra 7.8% enhancement in light extraction efficiency was obtained. Therefore, comparing to the conventional LED, an overall 45% enhancement in integrated output power was achieved.en_US
dc.language.isoen_USen_US
dc.subjectepitaxial growthen_US
dc.subjectlight-emitting diodes (LEDs)en_US
dc.subjectoptical device fabricationen_US
dc.titleStudy of GaN-based light-emitting diodes grown on chemical wet-etching-patterned sapphire substrate with V-shaped pits roughening surfacesen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/JLT.2008.922151en_US
dc.identifier.journalJOURNAL OF LIGHTWAVE TECHNOLOGYen_US
dc.citation.volume26en_US
dc.citation.issue9-12en_US
dc.citation.spage1455en_US
dc.citation.epage1463en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000256971400051-
dc.citation.woscount23-
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