8吋矽晶圓半導體LPCVD製程設備之研發---子計畫I：LPCVD製程設備之加熱及進氣系統設計、流場模擬與系統整合及建立(III)

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882218E009002.pdf (412.24 KB)

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1999

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進氣系統, 晶圓, 熱傳導, 催化劑, 熱傳遞, 反應器, Gas feeding system, Wafer, Thermal conductivity, Precursor, Heat transfer, Reactor

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https://www.grb.gov.tw/search/planDetail?id=419317&docId=74448
 https://ir.lib.nycu.edu.tw/handle/11536/94315

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研究計畫;;Research Plans

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