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dc.contributor.authorHsiao, Yu-Shengen_US
dc.contributor.authorWhang, Wha-Tzongen_US
dc.contributor.authorWu, Sheng-Changen_US
dc.contributor.authorChuang, Kuen-Ruen_US
dc.date.accessioned2014-12-08T15:12:16Z-
dc.date.available2014-12-08T15:12:16Z-
dc.date.issued2008-04-30en_US
dc.identifier.issn0040-6090en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.tsf.2007.12.166en_US
dc.identifier.urihttp://hdl.handle.net/11536/9436-
dc.description.abstractFlexible polyimide (PI) films for flexible electronics were surface-nickelized using a fully solution-based process and excellent adhesion between the nickel and polyimide phases was observed. Polyimide substrates were modified by alkaline hydrolysis, ion exchange, reduction and nickel electroless deposition without palladium. Atomic force microscopy and field emission scanning electron microscopy were used to follow the growth of nickel nanoparticles (Ni-NPs) and nickel layers on the polyimide surface. The surface resistances of the Ni-NPs/PI films and Ni/PI films, measured using a four-point probe, were 1.6x10(7) and 0.83 Omega/cm(2), respectively. The thicknesses of Ni-NPs and the Ni layer on the polyimide surface were 82 nm and 382 nm, respectively, as determined by transmission electron microscopy, and the Ni layer adhered well to PI, as determined by the adhesive tape testing method. (c) 2008 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectflexible electronicsen_US
dc.subjectpolyimideen_US
dc.subjectnickel electroless depositionen_US
dc.titleChemical formation of palladium-free surface-nickelized polyimide film for flexible electronicsen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.tsf.2007.12.166en_US
dc.identifier.journalTHIN SOLID FILMSen_US
dc.citation.volume516en_US
dc.citation.issue12en_US
dc.citation.spage4258en_US
dc.citation.epage4266en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000255125900087-
dc.citation.woscount20-
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