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dc.contributor.author林登松en_US
dc.contributor.authorDENG-SUNGLINen_US
dc.date.accessioned2014-12-13T10:37:08Z-
dc.date.available2014-12-13T10:37:08Z-
dc.date.issued1999en_US
dc.identifier.govdocNSC88-2112-M009-005zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/94413-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=426144&docId=76091en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.language.isozh_TWen_US
dc.subject半導體zh_TW
dc.subject雜質zh_TW
dc.subject化學氣相沈積zh_TW
dc.subject表面物理zh_TW
dc.subjectSemiconductoren_US
dc.subjectImpurityen_US
dc.subjectChemical vapor deposition (CVD)en_US
dc.subjectSurface physicsen_US
dc.title第三、五族雜質在矽、鍺晶面上氣相生長之原子與電子結構研究zh_TW
dc.titleAtomic Level Investigation of Boron and Phosphorus Chemical Vapor Deposition on Si, Ge Surfacesen_US
dc.typePlanen_US
dc.contributor.department交通大學物理研究所zh_TW
Appears in Collections:Research Plans


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