完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.author | 馮明憲 | en_US |
| dc.date.accessioned | 2014-12-13T10:37:09Z | - |
| dc.date.available | 2014-12-13T10:37:09Z | - |
| dc.date.issued | 1999 | en_US |
| dc.identifier.govdoc | NSC88-2215-E009-049 | zh_TW |
| dc.identifier.uri | http://hdl.handle.net/11536/94429 | - |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=444252&docId=80454 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.language.iso | zh_TW | en_US |
| dc.subject | 超高真空 | zh_TW |
| dc.subject | 化學氣相沈積法 | zh_TW |
| dc.subject | 多晶矽 | zh_TW |
| dc.subject | 準分子雷射 | zh_TW |
| dc.subject | 快速退火 | zh_TW |
| dc.subject | 薄膜電晶體 | zh_TW |
| dc.subject | Ultra high vacuum (UHV) | en_US |
| dc.subject | Chemical vapor deposition (CVD) | en_US |
| dc.subject | Polysilicon | en_US |
| dc.subject | Excimer laser | en_US |
| dc.subject | Rapid thermal annealing | en_US |
| dc.subject | Thin film transistor (TFT) | en_US |
| dc.title | 超高真空化學氣相沈積低溫新穎複晶矽薄膜電晶體之製作與可靠度分析---子計畫II：退火製程對超高真空化學氣相沈積法成長之複晶矽薄膜結構的影響與退火複晶矽薄膜電晶體的製作 | zh_TW |
| dc.title | Annealing Effects on UHVCVD Polysilicon Thin-Film Structure and Fabrication of Annealed Polysilicon TFT | en_US |
| dc.type | Plan | en_US |
| dc.contributor.department | 交通大學材料科學與工程研究所 | zh_TW |
| 顯示於類別： | 研究計畫 | |
