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dc.contributor.authorLee, Chia-Tienen_US
dc.contributor.authorChen, Szu-Fenen_US
dc.contributor.authorChen, Huang-Fling Philipen_US
dc.date.accessioned2014-12-08T15:12:18Z-
dc.date.available2014-12-08T15:12:18Z-
dc.date.issued2007en_US
dc.identifier.isbn978-957-28522-4-8en_US
dc.identifier.urihttp://hdl.handle.net/11536/9457-
dc.description.abstractIt is well known that the operating state (bend state) of a pi-cell must be nucleated then uniformly spread the bend orientation in splay state before operation. In this study, the random distribution of silicon oxide nano-particles was investigated for decreasing the time of splay-to-bend transition in pi-cells. Under the optimum conditions, the 50% reduction of splay-to-bend transition time was found in nanostructure structure treated surfaces.en_US
dc.language.isoen_USen_US
dc.titleNanostructure structure effect on transition in pi-cellsen_US
dc.typeProceedings Paperen_US
dc.identifier.journalIDMC'07: PROCEEDINGS OF THE INTERNATIONAL DISPLAY MANUFACTURING CONFERENCE 2007en_US
dc.citation.spage78en_US
dc.citation.epage80en_US
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentInstitute of Displayen_US
dc.identifier.wosnumberWOS:000258177700020-
顯示於類別:會議論文