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單晶之CVD薄膜和熔化成長法製程中的不穩定熱流與使其穩定之研究---總計畫(I)
單晶之CVD薄膜和熔化成長法製程中的不穩定熱流與使其穩定之研究---總計畫(I)
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Date
1996
Authors
林清發
LIN TSING-FA
Journal Title
Journal ISSN
Volume Title
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DOI
Abstract
Description
Keywords
薄膜單晶
,
浮力
,
不穩定熱流
,
化學蒸鍍法
,
晶體生長
,
Thin film single crystal
,
Buoyancy
,
Unstable flow
,
CVD
,
Crystal growth
Citation
URI
https://www.grb.gov.tw/search/planDetail?id=230687&docId=41960
https://ir.lib.nycu.edu.tw/handle/11536/95781
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