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dc.contributor.authorAhn, H.en_US
dc.contributor.authorKu, Y. -P.en_US
dc.contributor.authorChuang, C. -H.en_US
dc.contributor.authorPan, C. -L.en_US
dc.contributor.authorLin, H. -W.en_US
dc.contributor.authorHong, Y. -L.en_US
dc.contributor.authorGwo, S.en_US
dc.date.accessioned2014-12-08T15:12:28Z-
dc.date.available2014-12-08T15:12:28Z-
dc.date.issued2008-03-10en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.2892655en_US
dc.identifier.urihttp://hdl.handle.net/11536/9580-
dc.description.abstractWe report a significant enhancement in terahertz emission from the indium nitride (InN) films grown along the a axis (a-plane InN), relative to the InN films grown along the c axis. The primary radiation mechanism of the a-plane InN film is found to be due to the acceleration of photoexcited carriers under the polarization-induced in-plane electric field perpendicular to the a axis, which effectively enhances the geometrical coupling of the radiation out of semiconductor. In addition, azimuthal angle dependence measurement shows that the p-polarized terahertz output consists of a large angularly independent component and a weak component with a distinctive fourfold rotation symmetry. (c) 2008 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleIntense terahertz emission from a-plane InN surfaceen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.2892655en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume92en_US
dc.citation.issue10en_US
dc.citation.epageen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000253989300065-
dc.citation.woscount32-
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