| 標題: | Fizeau干涉儀準直鏡與十字線刻畫板組裝公差分析 The Analysis of Required Tolerances for the Misalignment of Collimating Lens and the Decentration of Cross-Line Reticle in Assembling a Fizeau Interferometer |
| 作者: | 陸懋宏 國立交通大學光電工程研究所 |
| 關鍵字: | Fizeau干涉儀;波面像差理論;Fizeau interferometer;Wavefront aberration theory |
| 公開日期: | 1996 |
| 官方說明文件#: | NSC85-2215-E009-004 |
| URI: | http://hdl.handle.net/11536/95895 https://www.grb.gov.tw/search/planDetail?id=230038&docId=41783 |
| 顯示於類別： | 研究計畫 |
- The sensitivity of the common focus error of a reference lens on the measurement accuracy in a Fizeau interferometer / Yeh, MS;Shiue, SG;Lu, MH
- The sensitivity of the common focus error of a reference lens on the measurement accuracy in a Fizeau interferometer / Yeh, MS;Shiue, SG;Lu, MH
- 3D surface profile measurement of unsymmetrical microstructure using Fizeau interferometric microscope / Yang, Shih-Wei;Lin, Chern-Sheng;Lin, Shir-Kuan
- Aberrations measurement of fiber-end microlens by free-space microoptical Ronchi interferometer / Tien, C. H.;Hung, C. H.;Lee, C. H.
- An automatic optical inspection system for measuring a microlens array with an optical interferometric microscope and genetic algorithm / Yang, Shih-Wei;Lin, Chern-Sheng;Lin, Shir-Kuan;Fu, Shu-Hsien;Yeh, Mau-Shiun
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