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dc.contributor.author張秉衡en_US
dc.date.accessioned2014-12-13T10:40:23Z-
dc.date.available2014-12-13T10:40:23Z-
dc.date.issued1994en_US
dc.identifier.govdocNSC83-0404-E009-098zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/97457-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=110644&docId=17682en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.language.isozh_TWen_US
dc.title鋁膜中摻雜 Si 及Cu對其陽極氧化薄膜生成之影響及其在IC上之應用zh_TW
dc.titleEffect of Si and Cu Doping on the Anodic Oxide Formation of Al Thin Films and Their IC Applicationsen_US
dc.typePlanen_US
dc.contributor.department國立交通大學材料科學工程研究所zh_TW
Appears in Collections:Research Plans