鋁膜中摻雜 Si 及Cu對其陽極氧化薄膜生成之影響及其在IC上之應用

Full metadata record

DC Field	Value	Language
dc.contributor.author	張秉衡	en_US
dc.date.accessioned	2014-12-13T10:40:23Z	-
dc.date.available	2014-12-13T10:40:23Z	-
dc.date.issued	1994	en_US
dc.identifier.govdoc	NSC83-0404-E009-098	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/97457	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=110644&docId=17682	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.title	鋁膜中摻雜 Si 及Cu對其陽極氧化薄膜生成之影響及其在IC上之應用	zh_TW
dc.title	Effect of Si and Cu Doping on the Anodic Oxide Formation of Al Thin Films and Their IC Applications	en_US
dc.type	Plan	en_US
dc.contributor.department	國立交通大學材料科學工程研究所	zh_TW
Appears in Collections:	Research Plans