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dc.contributor.authorShiu, Jau-Yeen_US
dc.contributor.authorWhang, Wha-Tzongen_US
dc.contributor.authorChen, Peilinen_US
dc.date.accessioned2014-12-08T15:12:49Z-
dc.date.available2014-12-08T15:12:49Z-
dc.date.issued2008en_US
dc.identifier.issn0169-4243en_US
dc.identifier.urihttp://hdl.handle.net/11536/9874-
dc.identifier.urihttp://dx.doi.org/10.1163/156856108X320032en_US
dc.description.abstractWe have developed two simple techniques to impart superhydrophobic properties to the surfaces of microdevices. In the first approach, thin films of a fluoropolymer were spin-coated on the device surfaces followed by an oxygen plasma treatment. By varying the oxygen plasma treatment time, the water contact angles on device surface could be tuned from 120 degrees to 169 degrees. In the second approach, a nanoimprint process was used to create nanostructures on the devices. To fabricate nanoimprint stamps with various feature sizes, nanosphere lithography was employed to produce a monolayer of well-ordered close-packed nanoparticle array on the silicon surfaces. After oxygen plasma trimming, metal deposition and dry etching process, silicon stamps with different nanostructures were obtained. These stamps were used to imprint nanostructures on hydrophobic coatings, such as Teflon, over the device surfaces. The water contact angle as high as 167 degrees was obtained by the second approach. (c) Koninklijke Brill NV, Leiden, 2008en_US
dc.language.isoen_USen_US
dc.subjectSuperhydrophobicen_US
dc.subjectnanosphere lithographyen_US
dc.subjectnanoimprinten_US
dc.subjectcoatingen_US
dc.titleSuperhydrophobic Coatings for Microdevicesen_US
dc.typeReviewen_US
dc.identifier.doi10.1163/156856108X320032en_US
dc.identifier.journalJOURNAL OF ADHESION SCIENCE AND TECHNOLOGYen_US
dc.citation.volume22en_US
dc.citation.issue15en_US
dc.citation.spage1883en_US
dc.citation.epage1891en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000262393500006-
dc.citation.woscount9-
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