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dc.contributor.authorCheng, Shiau-Shinen_US
dc.contributor.authorYang, Chuan-Yien_US
dc.contributor.authorOu, Chun-Weien_US
dc.contributor.authorChuang, You-Cheen_US
dc.contributor.authorWu, Meng-Chyien_US
dc.contributor.authorChu, Chih-Weien_US
dc.date.accessioned2014-12-08T15:12:52Z-
dc.date.available2014-12-08T15:12:52Z-
dc.date.issued2008en_US
dc.identifier.issn1099-0062en_US
dc.identifier.urihttp://hdl.handle.net/11536/9921-
dc.identifier.urihttp://dx.doi.org/10.1149/1.2844285en_US
dc.description.abstractPentacene thin-film transistors operated at low voltages have been realized by employing hybrid dielectrics, poly(4-vinylphenol) (PVP)-capped MgO. The MgO film was deposited by reactive evaporation of magnesium in oxygen. The PVP layer plays a role in modifying the surface morphology of the MgO layer, and the images of atomic force microscopy for the PVP-capped MgO films show a root-mean-square roughness of 1 nm. The hybrid dielectric has a dielectric constant of 7.05 with a dielectric strength. The fabricated pentacene organic thin-film transistors exhibit a mobility of 0.66 cm(2)/V s, a threshold voltage of -2.67 V, and an on/off ratio of 10(3). (c) 2008 The Electrochemical Society.en_US
dc.language.isoen_USen_US
dc.titlePentacene thin-film transistor with PVP-capped high-k MgO dielectric grown by reactive evaporationen_US
dc.typeArticleen_US
dc.identifier.doi10.1149/1.2844285en_US
dc.identifier.journalELECTROCHEMICAL AND SOLID STATE LETTERSen_US
dc.citation.volume11en_US
dc.citation.issue5en_US
dc.citation.spageH118en_US
dc.citation.epageH120en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000253989800020-
dc.citation.woscount7-
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