標題: Advanced process control of the critical dimension in photolithography
作者: Wu, Chien-Feng
Hung, Chih-Ming
Chen, Juhn-Horng
Lee, An-Chen
機械工程學系
Department of Mechanical Engineering
關鍵字: run-to-run (R2R) controller;nonlinear multiple exponential-weight moving-average controller;dynamic model-tuning minimum-variance (DMTMV) controller;photolithography process
公開日期: 1-Jan-2008
摘要: This paper describes two run-to-run controllers, a nonlinear multiple exponential-weight moving-average (NMEWMA) controller and a dynamic model-tuning minimum-variance (DMTMV) controller, for photolithography processes. The relationships between the input recipes (exposure dose and focus) and output variables (critical dimensions) were formed using an experimental design method, and the photolithography process model was built using a multiple regression analysis. Both the NMEWMA and DMTMV controllers could update the process model and obtain the optimal recipes for the next run. Quantified improvements were obtained from simulations and real photolithography processes.
URI: http://hdl.handle.net/11536/9956
ISSN: 1229-8557
期刊: INTERNATIONAL JOURNAL OF PRECISION ENGINEERING AND MANUFACTURING
Volume: 9
Issue: 1
起始頁: 12
結束頁: 18
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