| 標題: | 考慮能產生友善三重曝光樣形以及平衡光罩密度的非點格式細部繞線器 Triple-Pattern-Lithography-Friendly and Mask-Density-Balancing-Aware Gridless Detailed Routing |
| 作者: | 李毅郎 Li Yih-Lang 國立交通大學資訊工程學系（所） |
| 公開日期: | 2014 |
| 官方說明文件#: | MOST103-2221-E009-223 |
| URI: | http://hdl.handle.net/11536/99994 https://www.grb.gov.tw/search/planDetail?id=8350958&docId=445293 |
| 顯示於類別： | 研究計畫 |
- 考量三重曝光微影技術及平衡光罩密度的非點格式細部繞線方法 / 紀凱智;Chi, Kai-Chih;李毅郎;Li, Yih-Lang
- DOPPLER: DPL-aware and OPC-friendly Gridless Detailed Routing with Mask Density Balancing / Lin, Yen-Hung;Ban, Yong-Chan;Pan, David Z.;Li, Yih-Lang
- Double Patterning Lithography Aware Gridless Detailed Routing with Innovative Conflict Graph / Lin, Yen-Hung;Li, Yih-Lang
- TRIAD: A Triple Patterning Lithography Aware Detailed Router / Lin, Yen-Hung;Yu, Bei;Pan, David Z.;Li, Yih-Lang
- Multiple-Patterning Lithography-Aware Routing for Standard Cell Layout Synthesis / Lin, Kuen-Wey;Li, Yih-Lang;Lin, Rung-Bin
- 在奈米設計繞線中針對效率,可製造性與良率的最佳化 / 林彥宏;Lin, Yen-Hung;李毅郎;Li, Yih-Lang
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