以雷射技術研究大氣化學之重要分子---氟氯烷取代物研究---子計畫II：與OH及Cl之反應速率
| dc.contributor.author | 王念夏 | en_US |
| dc.contributor.author | WANG NIANN SHIAH | en_US |
| dc.contributor.department | 交通大學應用化學系 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:37:17Z | |
| dc.date.available | 2014-12-13T10:37:17Z | |
| dc.date.issued | 1999 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC88-2113-M009-007-L1 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=416981&docId=73900 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/94514 | |
| dc.language.iso | zh_TW | en_US |
| dc.subject | 氟氯烷取代物 | zh_TW |
| dc.subject | 反應速率 | zh_TW |
| dc.subject | 氯原子 | zh_TW |
| dc.subject | 羥自由基 | zh_TW |
| dc.subject | Freon substitute | en_US |
| dc.subject | Reaction rate | en_US |
| dc.subject | Chlorine atom | en_US |
| dc.subject | Hydroxyl radical | en_US |
| dc.title | 以雷射技術研究大氣化學之重要分子---氟氯烷取代物研究---子計畫II：與OH及Cl之反應速率 | zh_TW |
| dc.title | Freon Substitutes---Reaction Rates with OH and Cl | en_US |
| dc.type | Plan | en_US |