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Design of ESD Protection Diodes With Embedded SCR for Differential LNA in a 65-nm CMOS Process

dc.citation.epage2732en_US
dc.citation.issue11en_US
dc.citation.spage2723en_US
dc.citation.volume62en_US
dc.citation.woscount0en_US
dc.contributor.authorLin, Chun-Yuen_US
dc.contributor.authorFan, Mei-Lianen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2015-07-21T11:20:42Z
dc.date.available2015-07-21T11:20:42Z
dc.date.issued2014-11-01en_US
dc.description.abstractThe pin-to-pin electrostatic discharge (ESD) issue for a differential low-noise amplifier (LNA) was studied in this work. A new design of ESD protection diodes with an embedded silicon-controlled rectifier (SCR) was proposed to protect the gigahertz differential LNA. The proposed ESD protection design was modified from the conventional ESD protection design without adding any extra device. The SCR path was established directly from one differential input pad to the other differential input pad so the pin-to-pin ESD robustness can be improved. This design had been verified in a 65-nm CMOS process. Besides, this design had been further applied to a 24-GHz LNA in the same 65-nm CMOS process. Experimental results had shown that the proposed ESD protection design for the differential LNA can achieve excellent ESD robustness and good RF performances.en_US
dc.identifier.doi10.1109/TMTT.2014.2356975en_US
dc.identifier.issn0018-9480en_US
dc.identifier.journalIEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUESen_US
dc.identifier.urihttp://dx.doi.org/10.1109/TMTT.2014.2356975en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/123934
dc.identifier.wosnumberWOS:000344990700024en_US
dc.language.isoen_USen_US
dc.subjectDifferential low-noise amplifier (LNA)en_US
dc.subjectdiodeen_US
dc.subjectelectrostatic discharge (ESD)en_US
dc.subjectRFen_US
dc.subjectsilicon-controlled rectifier (SCR)en_US
dc.titleDesign of ESD Protection Diodes With Embedded SCR for Differential LNA in a 65-nm CMOS Processen_US
dc.typeArticleen_US

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