8吋矽晶圓半導體LPCVD製程設備之研發---子計畫四：利用LPCVD法成長Ta/sub 2/O/sub 5/薄膜與特性分析(I)

dc.contributor.author	曾俊元	en_US
dc.contributor.author	TSEUNG-YUENTSENG	en_US
dc.contributor.department	交通大學電子工程系	zh_TW
dc.date.accessioned	2014-12-13T10:38:17Z
dc.date.available	2014-12-13T10:38:17Z
dc.date.issued	1997	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.identifier.govdoc	NSC86-2221-E009-045	zh_TW
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=293407&docId=53716	en_US
dc.identifier.uri	https://ir.lib.nycu.edu.tw/handle/11536/95211
dc.language.iso	zh_TW	en_US
dc.subject	五氧化二鉭	zh_TW
dc.subject	低壓化學蒸鍍法	zh_TW
dc.subject	晶圓	zh_TW
dc.subject	薄膜生長	zh_TW
dc.subject	Tantalum pentaoxide	en_US
dc.subject	LPCVD	en_US
dc.subject	Wafer	en_US
dc.subject	Thin film growth	en_US
dc.title	8吋矽晶圓半導體LPCVD製程設備之研發---子計畫四：利用LPCVD法成長Ta/sub 2/O/sub 5/薄膜與特性分析(I)	zh_TW
dc.title	Growth and Characterization of LPCVD Ta/sub 2/O/sub 5/ Thin Films (Ⅰ)	en_US
dc.type	Plan	en_US

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