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Magnetotransport in an aluminum thin film on a GaAs substrate grown by molecular beam epitaxy

dc.citation.volume6en_US
dc.citation.woscount1
dc.contributor.authorLo, Shun-Tsungen_US
dc.contributor.authorChuang, Chiashainen_US
dc.contributor.authorLin, Sheng-Dien_US
dc.contributor.authorChen, Kuang Yaoen_US
dc.contributor.authorLiang, Chi-Teen_US
dc.contributor.authorLin, Shih-Weien_US
dc.contributor.authorWu, Jau-Yangen_US
dc.contributor.authorYeh, Mao-Rongen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:37:47Z
dc.date.available2014-12-08T15:37:47Z
dc.date.issued2011en_US
dc.description.abstractMagnetotransport measurements are performed on an aluminum thin film grown on a GaAs substrate. A crossover from electron- to hole-dominant transport can be inferred from both longitudinal resistivity and Hall resistivity with increasing the perpendicular magnetic field B. Also, phenomena of localization effects can be seen at low B. By analyzing the zero-field resistivity as a function of temperature T, we show the importance of surface scattering in such a nanoscale film.en_US
dc.identifier.doi10.1186/1556-276X-6-102en_US
dc.identifier.issn1931-7573en_US
dc.identifier.journalNANOSCALE RESEARCH LETTERSen_US
dc.identifier.urihttp://dx.doi.org/10.1186/1556-276X-6-102en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/25983
dc.identifier.wosnumberWOS:000290525700041
dc.language.isoen_USen_US
dc.titleMagnetotransport in an aluminum thin film on a GaAs substrate grown by molecular beam epitaxyen_US
dc.typeArticleen_US

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