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Ultrafast Initial Growth Rate of Self-Assembled TiO2 Nanorod Arrays Fabricated by Ti Anodization

dc.citation.volume14en_US
dc.citation.woscount8en_US
dc.contributor.authorChang, Yung-Huangen_US
dc.contributor.authorLin, Hsiao-Weien_US
dc.contributor.authorChen, Chihen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.date.accessioned2019-04-02T06:00:26Z
dc.date.available2019-04-02T06:00:26Z
dc.date.issued2011-01-01en_US
dc.description.abstractThe growth mechanism of TiO2 nanorods fabricated by the anodization of Ti films using a mask of anodic aluminum oxide is investigated by examining the growth rate and morphology of the fabricated nanorods. It is found that the growth rate is 250 nm/s within the first 0.1 s at 117 V and decreases abruptly to 0.79 nm/s after 3 s. In addition, the diameter of the nanorods is larger near the top than near the root of the nanorods. A growth mechanism is proposed to explain these interesting phenomena. (C) 2010 The Electrochemical Society. [DOI: 10.1149/1.3496404] All rights reserved.en_US
dc.identifier.doi10.1149/1.3496404en_US
dc.identifier.issn1099-0062en_US
dc.identifier.journalELECTROCHEMICAL AND SOLID STATE LETTERSen_US
dc.identifier.urihttp://dx.doi.org/10.1149/1.3496404en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/150163
dc.identifier.wosnumberWOS:000284317600031en_US
dc.language.isoen_USen_US
dc.titleUltrafast Initial Growth Rate of Self-Assembled TiO2 Nanorod Arrays Fabricated by Ti Anodizationen_US
dc.typeArticleen_US

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