12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---子計畫三：利用CVD法成長BST薄膜與特性分析(II)
| dc.contributor.author | 曾俊元 | en_US |
| dc.contributor.author | TSEUNG-YUENTSENG | en_US |
| dc.contributor.department | 國立交通大學電子工程學系 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:44:31Z | |
| dc.date.available | 2014-12-13T10:44:31Z | |
| dc.date.issued | 2000 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC89-2212-E009-081 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=548932&docId=101309 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/100039 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | 12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---子計畫三：利用CVD法成長BST薄膜與特性分析(II) | zh_TW |
| dc.title | Growth and Characterizations of CVD BST Thin Films(II) | en_US |
| dc.type | Plan | en_US |
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