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GAAS BIDIRECTIONAL BISTABILITY SWITCH USING DOUBLE TRIANGULAR BARRIER STRUCTURES

dc.citation.epage2698en_US
dc.citation.issue5en_US
dc.citation.spage2695en_US
dc.citation.volume75en_US
dc.citation.woscount2
dc.contributor.authorYARN, KFen_US
dc.contributor.authorWANG, YHen_US
dc.contributor.authorCHANG, CYen_US
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.date.accessioned2014-12-08T15:04:05Z
dc.date.available2014-12-08T15:04:05Z
dc.date.issued1994-03-01en_US
dc.description.abstractWe report on the experimental results of a new bidirectional bistability switching device using GaAs double triangular barrier structures prepared by molecular beam epitaxy. Bidirectional switching has been predicted experimentally in n+-n--delta(p+)-n--p+-n--delta(p+)-n--n+ structure. The significant S-shaped negative differential resistance characteristics are obtained due to the voltage-induced avalanche breakdown and potential barrier redistribution. A large on/off voltage ratio of approximately 6.5 is observed in either direction of two-state at room temperature. In addition, the device can be expected to operate as a three-terminal triggered triac.en_US
dc.identifier.doi10.1063/1.357020en_US
dc.identifier.issn0021-8979en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.357020en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/2589
dc.identifier.wosnumberWOS:A1994MY99500060
dc.language.isoen_USen_US
dc.titleGAAS BIDIRECTIONAL BISTABILITY SWITCH USING DOUBLE TRIANGULAR BARRIER STRUCTURESen_US
dc.typeArticleen_US

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