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Effect of modulating field on photoreflectance simulated by electroreflectance

dc.citation.epage3773en_US
dc.citation.issue7en_US
dc.citation.spage3770en_US
dc.citation.volume85en_US
dc.citation.woscount5
dc.contributor.authorChiou, SJen_US
dc.contributor.authorSung, YGen_US
dc.contributor.authorWang, DPen_US
dc.contributor.authorHuang, KFen_US
dc.contributor.authorHuang, TCen_US
dc.contributor.authorChu, AKen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.date.accessioned2014-12-08T15:46:42Z
dc.date.available2014-12-08T15:46:42Z
dc.date.issued1999-04-01en_US
dc.description.abstractPhotoreflectance (PR) of surface-intrinsic- n(+) (s-i-n(+)) type doped GaAs has been simulated by electroreflectance (ER). The simulated spectra of the s-i-n(+) sample have exhibited many Franz-Keldysh oscillations, which enable the electric field (F) to be determined. It is known that F's determined from PR are subjected to photovoltaic effect and the measured F is close to F-bi -delta F/2 when the modulating field, delta F much less than F-bi, where F-bi is the built- in field of the sample and delta F is the modulating field. In this work, we have investigated the relation between the measured F and delta F not only for the region where delta F much less than F bi holds, but also for a whole range of delta F. In order to determine the magnitude of dF, we have used ER to simulate PR, that is, the measurements of ER under a forward bias, which is set to be equal to delta F/2. (C) 1999 American Institute of Physics. [S0021-8979(99)01906-4].en_US
dc.identifier.issn0021-8979en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/31406
dc.identifier.wosnumberWOS:000079403900058
dc.language.isoen_USen_US
dc.titleEffect of modulating field on photoreflectance simulated by electroreflectanceen_US
dc.typeArticleen_US

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