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Oxygen Plasma Functioning of Charge Carrier Density in Zinc Oxide Thin-Film Transistors

dc.citation.epageen_US
dc.citation.issue7en_US
dc.citation.volume6en_US
dc.citation.woscount3
dc.contributor.authorChu, Min-Chingen_US
dc.contributor.authorMeena, Jagan Singhen_US
dc.contributor.authorLiu, Po-Tsunen_US
dc.contributor.authorShieh, Han-Ping D.en_US
dc.contributor.authorYou, Hsin-Chiangen_US
dc.contributor.authorTu, Yen-Weien_US
dc.contributor.authorChang, Feng-Chihen_US
dc.contributor.authorKo, Fu-Hsiangen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
dc.date.accessioned2014-12-08T15:32:05Z
dc.date.available2014-12-08T15:32:05Z
dc.date.issued2013-07-01en_US
dc.description.abstractA change in the charge carrier density of zinc oxide (ZnO) films for control the functioning of thin-film transistors (TFTs) has been studied by oxygen (O-2) plasma techniques. This effect was interpreted in terms of a threshold voltage shift and the variation in carrier mobility. The plasma-surface interaction on the molecular level and the behavioral characterization of ZnO films were investigated by X-ray photospectroscopy of the O 1s region. This process was highly sensitive at low level variations in defect and doping density. O-2 plasma treatment leads to a shift of turn-on voltage and a reduction of the off-current by more than two orders of magnitude in ZnO-TFTs. (C) 2013 The Japan Society of Applied Physicsen_US
dc.identifier.doi10.7567/APEX.6.076501en_US
dc.identifier.issn1882-0778en_US
dc.identifier.journalAPPLIED PHYSICS EXPRESSen_US
dc.identifier.urihttp://dx.doi.org/10.7567/APEX.6.076501en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/22610
dc.identifier.wosnumberWOS:000321699300042
dc.language.isoen_USen_US
dc.titleOxygen Plasma Functioning of Charge Carrier Density in Zinc Oxide Thin-Film Transistorsen_US
dc.typeArticleen_US

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