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A HIGH-DENSITY MOS STATIC RAM CELL USING THE LAMBDA BIPOLAR-TRANSISTOR

dc.citation.epage224en_US
dc.citation.issue2en_US
dc.citation.spage222en_US
dc.citation.volume18en_US
dc.citation.woscount6
dc.contributor.authorWU, CYen_US
dc.contributor.authorLIU, YFen_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.date.accessioned2014-12-08T15:06:22Z
dc.date.available2014-12-08T15:06:22Z
dc.date.issued1983en_US
dc.identifier.issn0018-9200en_US
dc.identifier.journalIEEE JOURNAL OF SOLID-STATE CIRCUITSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/4941
dc.identifier.wosnumberWOS:A1983QS53700012
dc.language.isoen_USen_US
dc.titleA HIGH-DENSITY MOS STATIC RAM CELL USING THE LAMBDA BIPOLAR-TRANSISTORen_US
dc.typeLetteren_US

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