Low temperature deposition of high quality single crystalline AlN thin films on sapphire using highly oriented monolayer MoS 2 as a buffer layer
| dc.citation.epage | 0 | en_US |
| dc.citation.spage | 0 | en_US |
| dc.citation.volume | 544 | en_US |
| dc.citation.woscount | 0 | en_US |
| dc.contributor.author | Chien, Hung-Yi | en_US |
| dc.contributor.author | Kuo, Po-Chun | en_US |
| dc.contributor.author | Kao, Hui-Ling | en_US |
| dc.contributor.author | Chen, Jyh-Shin | en_US |
| dc.contributor.author | Chen, Meei-Ru | en_US |
| dc.contributor.author | Lu, Li-Syuan | en_US |
| dc.contributor.author | Chueh, Wei-Chen | en_US |
| dc.contributor.author | Chang, Wen-Hao | en_US |
| dc.contributor.department | 交大名義發表 | zh_TW |
| dc.contributor.department | 電子物理學系 | zh_TW |
| dc.contributor.department | National Chiao Tung University | en_US |
| dc.contributor.department | Department of Electrophysics | en_US |
| dc.date.accessioned | 2020-10-05T01:59:48Z | |
| dc.date.available | 2020-10-05T01:59:48Z | |
| dc.date.issued | 2020-08-15 | en_US |
| dc.identifier.doi | 10.1016/j.jcrysgro.2020.125726 | en_US |
| dc.identifier.issn | 0022-0248 | en_US |
| dc.identifier.journal | JOURNAL OF CRYSTAL GROWTH | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1016/j.jcrysgro.2020.125726 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/154931 | |
| dc.identifier.wosnumber | WOS:000541156700005 | en_US |
| dc.language.iso | en_US | en_US |
| dc.title | Low temperature deposition of high quality single crystalline AlN thin films on sapphire using highly oriented monolayer MoS 2 as a buffer layer | en_US |
| dc.type | Article | en_US |
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