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INVESTIGATION OF SI-SIO2 INTERFACE PROPERTIES FOR BONDED SILICON-ON-INSULATOR

dc.citation.epage1507en_US
dc.citation.issue19en_US
dc.citation.spage1506en_US
dc.citation.volume12en_US
dc.citation.woscount0
dc.contributor.authorYEH, CFen_US
dc.contributor.authorKAO, HWen_US
dc.contributor.authorCHANG, BSen_US
dc.contributor.authorCHANG, KLen_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.date.accessioned2014-12-08T15:04:20Z
dc.date.available2014-12-08T15:04:20Z
dc.date.issued1993-10-01en_US
dc.identifier.issn0261-8028en_US
dc.identifier.journalJOURNAL OF MATERIALS SCIENCE LETTERSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/2846
dc.identifier.wosnumberWOS:A1993MB24100007
dc.language.isoen_USen_US
dc.titleINVESTIGATION OF SI-SIO2 INTERFACE PROPERTIES FOR BONDED SILICON-ON-INSULATORen_US
dc.typeArticleen_US

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