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Room-temperature ferromagnetism in amorphous In-Ga-Zn-O films fabricated by using pulsed-laser deposition

dc.citation.epage1476en_US
dc.citation.issue3en_US
dc.citation.spage1473en_US
dc.citation.volume116en_US
dc.citation.woscount0
dc.contributor.authorLiu, Shiu-Jenen_US
dc.contributor.authorSu, Shih-Haoen_US
dc.contributor.authorJuang, Jenh-Yihen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.date.accessioned2014-12-08T15:36:41Z
dc.date.available2014-12-08T15:36:41Z
dc.date.issued2014-09-01en_US
dc.description.abstractRoom-temperature ferromagnetism (RTFM) was observed in pulsed-laser deposited amorphous In-Ga-Zn-O (a-IGZO) films undoped with impurities containing unpaired d or f electrons. The presence of oxygen vacancies in the prepared a-IGZO films was verified by X-ray photoelectron spectroscopy and suggested to be responsible for the observed RTFM. The electrical and optical properties of the a-IGZO films were also investigated.en_US
dc.identifier.doi10.1007/s00339-014-8263-0en_US
dc.identifier.issn0947-8396en_US
dc.identifier.journalAPPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSINGen_US
dc.identifier.urihttp://dx.doi.org/10.1007/s00339-014-8263-0en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/25035
dc.identifier.wosnumberWOS:000340583500074
dc.language.isoen_USen_US
dc.titleRoom-temperature ferromagnetism in amorphous In-Ga-Zn-O films fabricated by using pulsed-laser depositionen_US
dc.typeArticleen_US

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