Ultralow Reflection from a-Si Nanograss/Si Nanofrustum Double Layers
| dc.citation.epage | 1728 | en_US |
| dc.citation.issue | 12 | en_US |
| dc.citation.spage | 1724 | en_US |
| dc.citation.volume | 25 | en_US |
| dc.citation.woscount | 7 | |
| dc.contributor.author | Ravipati, Srikanth | en_US |
| dc.contributor.author | Shieh, Jiann | en_US |
| dc.contributor.author | Ko, Fu-Hsiang | en_US |
| dc.contributor.author | Yu, Chen-Chieh | en_US |
| dc.contributor.author | Chen, Hsuen-Li | en_US |
| dc.contributor.department | 材料科學與工程學系 | zh_TW |
| dc.contributor.department | Department of Materials Science and Engineering | en_US |
| dc.date.accessioned | 2014-12-08T15:29:45Z | |
| dc.date.available | 2014-12-08T15:29:45Z | |
| dc.date.issued | 2013-03-25 | en_US |
| dc.description.abstract | A double-layer nanostructure comprising amorphous Si nanograss on top of Si nanofrustums (NFs) with a total height of 680 nm exhibits ultralow reflection. Almost near-unity absorption and near-zero reflectance result in this layered nanostructure, over a broad range of wavelengths and a wide range of angles of incidence, due to the low packing density of a-Si and the smooth transition of the refractive index from the air to the Si substrate across both the nanograss and NF layers. | en_US |
| dc.identifier.doi | 10.1002/adma.201204235 | en_US |
| dc.identifier.issn | 0935-9648 | en_US |
| dc.identifier.journal | ADVANCED MATERIALS | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1002/adma.201204235 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/21374 | |
| dc.identifier.wosnumber | WOS:000316322600009 | |
| dc.language.iso | en_US | en_US |
| dc.subject | ultralow reflection | en_US |
| dc.subject | absorption | en_US |
| dc.subject | heterostructures | en_US |
| dc.subject | black materials | en_US |
| dc.title | Ultralow Reflection from a-Si Nanograss/Si Nanofrustum Double Layers | en_US |
| dc.type | Article | en_US |