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學術出版;;Publications
會議論文;;Conferences Paper
Comparisons on performance improvement by nitride capping layer among different channel directions nMOSFETs
Comparisons on performance improvement by nitride capping layer among different channel directions nMOSFETs
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Date
2007
Authors
Tsai, Tzu-, I
Lee, Yao-Jen
Chen, King-Sheng
Wang, Jeff
Hsueh, Fu-Kuo
Lin, Horng-Chih
Huang, Tiao-Yuan
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https://ir.lib.nycu.edu.tw/handle/11536/135144
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