Comparisons on performance improvement by nitride capping layer among different channel directions nMOSFETs

Title:	Comparisons on performance improvement by nitride capping layer among different channel directions nMOSFETs
Authors:	Tsai, Tzu-, I Lee, Yao-Jen Chen, King-Sheng Wang, Jeff Hsueh, Fu-Kuo Lin, Horng-Chih Huang, Tiao-Yuan 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics
Issue Date:	2007
URI:	http://hdl.handle.net/11536/135144
ISBN:	978-1-4244-1891-6
Journal:	2007 INTERNATIONAL SEMICONDUCTOR DEVICE RESEARCH SYMPOSIUM, VOLS 1 AND 2
Begin Page:	339
End Page:	+
Appears in Collections:	Conferences Paper