Comparisons on performance improvement by nitride capping layer among different channel directions nMOSFETs

標題:	Comparisons on performance improvement by nitride capping layer among different channel directions nMOSFETs
作者:	Tsai, Tzu-, I Lee, Yao-Jen Chen, King-Sheng Wang, Jeff Hsueh, Fu-Kuo Lin, Horng-Chih Huang, Tiao-Yuan 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics
公開日期:	2007
URI:	http://hdl.handle.net/11536/135144
ISBN:	978-1-4244-1891-6
期刊:	2007 INTERNATIONAL SEMICONDUCTOR DEVICE RESEARCH SYMPOSIUM, VOLS 1 AND 2
起始頁:	339
結束頁:	+
顯示於類別：	會議論文