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MICROSTRUCTURE AND PROPERTIES OF MULTILAYER-DERIVED TUNGSTEN SILICIDE

dc.citation.epage255en_US
dc.citation.issue4en_US
dc.citation.spage251en_US
dc.citation.volume16en_US
dc.citation.woscount0
dc.contributor.authorCHIOU, BSen_US
dc.contributor.authorRAU, HLen_US
dc.contributor.authorCHANG, PHen_US
dc.contributor.authorDUH, JGen_US
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.date.accessioned2014-12-08T15:06:04Z
dc.date.available2014-12-08T15:06:04Z
dc.date.issued1987-07-01en_US
dc.identifier.doi10.1007/BF02653362en_US
dc.identifier.issn0361-5235en_US
dc.identifier.journalJOURNAL OF ELECTRONIC MATERIALSen_US
dc.identifier.urihttp://dx.doi.org/10.1007/BF02653362en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/4634
dc.identifier.wosnumberWOS:A1987J352900005
dc.language.isoen_USen_US
dc.titleMICROSTRUCTURE AND PROPERTIES OF MULTILAYER-DERIVED TUNGSTEN SILICIDEen_US
dc.typeArticleen_US

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