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Multiple-cell square-type layout design for output transistors in submicron CMOS technology to save silicon area

dc.citation.epage1014en_US
dc.citation.issue6en_US
dc.citation.spage1007en_US
dc.citation.volume42en_US
dc.citation.woscount2
dc.contributor.authorKer, MDen_US
dc.contributor.authorWu, CYen_US
dc.contributor.authorHuang, CCen_US
dc.contributor.authorChen, TYen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:49:03Z
dc.date.available2014-12-08T15:49:03Z
dc.date.issued1998-06-01en_US
dc.description.abstractA new multiple-cell square-type layout design is proposed to realize the large-dimension output transistors for submicron low-voltage CMOS ICs. By using this layout design, the layout area of CMOS output buffers can be effectively reduced 30-40% with respect to the traditional finger-type layout. The drain-to-bulk parasitic capacitance of the output transistors is also reduced 40% by this square-type layout. Experimental results in a 0.6 mu m CMOS process have shown that the maximum driving (sinking) capability per unit layout area of a CMOS output buffer realized by the proposed multiple-cell square-type layout is improved 54% (34%) more than that by the traditional finger-type layout. The human-body-model (machine-model) ESD robustness per unit layout area of the CMOS output buffer realized by the proposed multiple-cell square-type layout is increased 25.2% (17.3%) as comparing to that by the traditional finger-type layout. (C) 1998 Published by Elsevier Science Ltd. All rights reserved.en_US
dc.identifier.issn0038-1101en_US
dc.identifier.journalSOLID-STATE ELECTRONICSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/32595
dc.identifier.wosnumberWOS:000074542500020
dc.language.isoen_USen_US
dc.titleMultiple-cell square-type layout design for output transistors in submicron CMOS technology to save silicon areaen_US
dc.typeArticleen_US

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